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dc.contributor.authorXu, Di Erick
dc.contributor.authorKim, Jang Baeg
dc.contributor.authorHook, Michael David
dc.contributor.authorJung, Jae Pil
dc.contributor.authorMayer, Michael
dc.date.accessioned2017-10-16 14:55:27 (GMT)
dc.date.available2017-10-16 14:55:27 (GMT)
dc.date.issued2018-01-15
dc.identifier.urihttp://dx.doi.org/10.1016/j.jallcom.2017.10.077
dc.identifier.urihttp://hdl.handle.net/10012/12553
dc.descriptionThe final publication is available at Elsevier via http://dx.doi.org/10.1016/j.jallcom.2017.10.077 © 2018. This manuscript version is made available under the CC-BY-NC-ND 4.0 license http://creativecommons.org/licenses/by-nc-nd/4.0/en
dc.description.abstractReal time resistance monitoring technology is used to study the silver sintering process. Signals of joint resistance show events such as resistance increase to >10 GΩ, abrupt resistance drop from >10 GΩ to <1 kΩ, and gradual resistance drop to <1 mΩ. Based on cross-sectioning of samples at various stages of sintering and differential scanning calorimetry (DSC), we propose a correlation between resistance signal and solvent evaporation, capping agent degradation, and silver sintering. We identified distinct clusters of sintered silver of samples removed from the oven when the resistance drops to ∼2.94 Ω.en
dc.description.sponsorshipNatural Science and Engineering Research Council [493701]en
dc.description.sponsorshipMicrobonds Inc., Markham [072396]en
dc.language.isoenen
dc.publisherElsevieren
dc.rightsAttribution-NonCommercial-NoDerivatives 4.0 International*
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/4.0/*
dc.subjectNon-destructive signalsen
dc.subjectReal time monitoringen
dc.subjectSilver sintering pasteen
dc.subjectSintering processen
dc.titleReal time resistance monitoring during sintering of silver pasteen
dc.typeArticleen
dcterms.bibliographicCitationXu, D. E., Kim, J. B., Hook, M. D., Jung, J. P., & Mayer, M. (2018). Real time resistance monitoring during sintering of silver paste. Journal of Alloys and Compounds, 731, 504–514. https://doi.org/10.1016/j.jallcom.2017.10.077en
uws.contributor.affiliation1Faculty of Engineeringen
uws.contributor.affiliation2Mechanical and Mechatronics Engineeringen
uws.typeOfResourceTexten
uws.peerReviewStatusRevieweden
uws.scholarLevelGraduateen


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