Scalable Single-Step Open-Air Combinatorial Growth of Multifunctional Metal Oxide Thin Films by Spatial Atomic Layer Deposition

dc.contributor.authorShahin, Ahmed
dc.contributor.authorSaini, Agosh
dc.contributor.authorVidish, Denys
dc.contributor.authorAzar, Mahdi Hasanzadeh
dc.contributor.authorKim, Na Young
dc.contributor.authorMusselman, Kevin P.
dc.date.accessioned2026-08-25T15:20:40Z
dc.date.issued2026-08-25
dc.description.abstractCompositionally graded metal oxide thin films enable rapid exploration of structure–property relationships, yet their fabrication typically relies on vacuum-based, multistep processes. Here, we present an atmospheric-pressure spatial atomic layer approach that enables the single-step, open-air synthesis of zinc–tin–oxide (ZTO) thin films with lateral compositional gradients over 3-in. wafer-scale substrates. A custom reactor head with spatially tailored precursor delivery generates continuous and reproducible composition gradients in under 1 h without vacuum processing or sequential depositions. Comprehensive structural, morphological, optical, and compositional characterization confirms smooth lateral variations in ZTO film composition and crystallinity, with Sn/Zn atomic ratios spanning approximately 0.4–0.8 across one of the films, forming unique material libraries in a single open-air deposition step. As a proof of concept, the graded ZTO films are integrated into chemiresistive sensor arrays comprising 20 compositionally distinct sensing columns on a single wafer, exhibiting composition- and temperature-dependent (at 200 °C) responses to volatile organic compounds within a single device platform. Additionally, electrical measurements performed across the gradient show unique current–voltage properties at each composition, alluding to multi-usage in electronic applications within the same chip. This work establishes a scalable and cost-effective strategy for rapid fabrication of oxide material libraries and wafer-scale collective device assemblies under ambient conditions.
dc.description.sponsorshipNatural Sciences and Engineering Research Council of Canada, CGV 198799, DGDND-2023-03548, RGPIN-03548-2023, RGPIN-2025-04474.
dc.identifier.urihttps://doi.org/10.1021/acsami.6c12174
dc.identifier.urihttps://hdl.handle.net/10012/24033
dc.language.isoen
dc.publisherAmerican Chemical Society
dc.relation.ispartofseriesACS Applied Materials & Interfaces
dc.subjectAP-SALD
dc.subjectcomposition gradient
dc.subjectmultifunctional metal oxides
dc.subjecthigh-throughput
dc.subjectmaterials discovery
dc.subjectcombinatorial synthesis
dc.titleScalable Single-Step Open-Air Combinatorial Growth of Multifunctional Metal Oxide Thin Films by Spatial Atomic Layer Deposition
dc.typeArticle
dcterms.bibliographicCitationShahin A., Saini, A., Vidish, D., Azar, M. H., Kim, N. Y., Musselman, K. P. (2026). Scalable single-step open-air combinatorial growth of multifunctional metal oxide thin films by spatial atomic layer deposition. ACS Applied Materials &b Interfaces.
uws.contributor.affiliation1Faculty of Engineering
uws.contributor.affiliation2Mechanical and Mechatronics Engineering
uws.contributor.affiliation2Waterloo Institute for Nanotechnology (WIN)
uws.contributor.affiliation2Institute of Quantum Computing (IQR)
uws.peerReviewStatusReviewed
uws.scholarLevelGraduate
uws.typeOfResourceTexten

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