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dc.contributor.authorAsgarimoghaddam, Hatameh
dc.date.accessioned2023-05-25 20:02:05 (GMT)
dc.date.available2024-05-25 04:50:05 (GMT)
dc.date.issued2023-05-25
dc.date.submitted2023-05-24
dc.identifier.urihttp://hdl.handle.net/10012/19485
dc.description.abstractIn this thesis, various alumina-based thin-film encapsulation layers including nitrogen-doped alumina, zinc-doped alumina and ZnO/Al2O3 nanolaminate structures are deposited by atmospheric-pressure spatial atomic layer deposition (AP-SALD) to investigate their deposition rate, microstructure, and barrier properties. Moreover, the thin-film composition is optimized to maximize the PSC long-term stability in harsh environmental conditions.en
dc.language.isoenen
dc.publisherUniversity of Waterlooen
dc.subjectSpatial atomic layer depositionen
dc.subjectThin film encapsulationen
dc.subjectperovskite solar cellsen
dc.titleSpatial Atomic Layer Deposition of Alumina-based Thin Film Encapsulation for High Performance Perovskite Solar Cellsen
dc.typeDoctoral Thesisen
dc.pendingfalse
uws-etd.degree.departmentMechanical and Mechatronics Engineeringen
uws-etd.degree.disciplineMechanical Engineering (Nanotechnology)en
uws-etd.degree.grantorUniversity of Waterlooen
uws-etd.degreeDoctor of Philosophyen
uws-etd.embargo.terms1 yearen
uws.contributor.advisorMusselman, Kevin
uws.contributor.affiliation1Faculty of Engineeringen
uws.published.cityWaterlooen
uws.published.countryCanadaen
uws.published.provinceOntarioen
uws.typeOfResourceTexten
uws.peerReviewStatusUnrevieweden
uws.scholarLevelGraduateen


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