Browsing University of Waterloo by Subject "spatial atomic layer deposition"
Now showing items 1-5 of 5
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Advancing the Industrialization of Thin Film Deposition: Tools for Mitigating Powder Formation in Spatial-ALD Systems and for Real-time, In-situ Metrology
(University of Waterloo, 2024-01-11)Thin-film manufacturing through Spatial Atomic Layer Deposition (SALD) offers high throughput and cost-saving advantages, but challenges such as powder formation and the lack of real-time in-situ metrology hinder its ... -
Controlling deposition location in atmospheric-pressure spatial atomic layer deposition
(University of Waterloo, 2023-12-05)Nanoscale thin films exhibit unique properties and functionalities and are significant in a wide variety of applications and various sectors such as microelectronics, energy harvesting and storage applications, optoelectronics, ... -
Controlling SALD-Deposited ZTO Nanofilm Composition and Implications for their use as Perovskite Solar Cell Transport Layers
(University of Waterloo, 2021-08-26)This thesis is concerned with the study of new nanofilm electron transport layers for use in perovskite solar cells, one of the thin film solar cell technologies in the research and very early commercial phases. Spatial ... -
Improving Dielectric Thin Films for Metal Insulator Metal Diodes and Perovskite Solar Cells
(University of Waterloo, 2021-08-25)Metal-insulator-metal (MIM) diodes are nano-electronic devices that operate by quantum tunneling of electrons through a thin dielectric layer to rectify high frequency alternating current (AC) to usable direct current (DC). ... -
In-situ observation of nucleation and property evolution in films grown with an atmospheric pressure spatial atomic layer deposition system.
(IOP Science, 2020-06-01)Atmospheric pressure—spatial atomic layer deposition (AP-SALD) is a promising open-air deposition technique for high-throughput manufacturing of nanoscale films, yet the nucleation and property evolution in these films has ...