UWSpace is currently experiencing technical difficulties resulting from its recent migration to a new version of its software. These technical issues are not affecting the submission and browse features of the site. UWaterloo community members may continue submitting items to UWSpace. We apologize for the inconvenience, and are actively working to resolve these technical issues.
 

E-beam Lithography using Dry Powder HSQ Resist Having Long Shelf Life and Nanogap Electrode Fabrication

Simple item page
dc.contributor.authorJiashi, Shen
dc.date.accessioned2018-09-28T17:43:35Z
dc.date.available2018-09-28T17:43:35Z
dc.date.issued2018-09-28
dc.date.submitted2018-09-24
dc.description.abstractAs the industry of nanofabrication developing, high-resolution e-beam lithography (EBL) becomes more and more important. In this thesis, it is discussed that the effective factors behind the resolution of EBL and how it works, trying to understand the capabilities and limits of different EBL resists and process to achieve high-resolution patterning. Practically, a new type of EBL resist and its lithography performance are reported. It is a solid state of HSQ. Comparing with traditional DOW-HSQ, it has a longer shelf life and even better contrast. What's more, a resolution boosting method involving two steps of exposure is also reported, which can be applied to fabricate the nanogap in-between block structures (electrodes).en
dc.identifier.urihttp://hdl.handle.net/10012/13962
dc.language.isoenen
dc.pendingfalse
dc.publisherUniversity of Waterlooen
dc.subjectElectron Beam Lithographyen
dc.subjectHSQen
dc.subjectNano-gapen
dc.titleE-beam Lithography using Dry Powder HSQ Resist Having Long Shelf Life and Nanogap Electrode Fabricationen
dc.typeMaster Thesisen
uws-etd.degreeMaster of Applied Scienceen
uws-etd.degree.departmentElectrical and Computer Engineeringen
uws-etd.degree.disciplineElectrical and Computer Engineering (Nanotechnology)en
uws-etd.degree.grantorUniversity of Waterlooen
uws.contributor.advisorBo, Cui
uws.contributor.affiliation1Faculty of Engineeringen
uws.peerReviewStatusUnrevieweden
uws.published.cityWaterlooen
uws.published.countryCanadaen
uws.published.provinceOntarioen
uws.scholarLevelGraduateen
uws.typeOfResourceTexten

Files

Original bundle
Now showing 1 - 1 of 1
Thumbnail Image
Name:
Shen_Jiashi.pdf
Size:
3.18 MB
Format:
Adobe Portable Document Format
Description:
Download
License bundle
Now showing 1 - 1 of 1
No Thumbnail Available
Name:
license.txt
Size:
6.08 KB
Format:
Item-specific license agreed upon to submission
Description:
Download

Collections

Theses
Electrical and Computer Engineering