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Browsing Waterloo Research by Subject "spatial atomic layer deposition"
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In-situ observation of nucleation and property evolution in films grown with an atmospheric pressure spatial atomic layer deposition system.
(IOP Science, 2020-06-01)Atmospheric pressure—spatial atomic layer deposition (AP-SALD) is a promising open-air deposition technique for high-throughput manufacturing of nanoscale films, yet the nucleation and property evolution in these films has ...