Generating patterns on clothing for seamless design

Abstract

Symmetric patterns are used widely in clothing manufacture. However, the discontinuity of patterns at seams can disrupt the visual appeal of clothing. While it is possible to align patterns to conceal such pattern breaks, it is hard create a completely seamless garment in terms of pattern continuity. In this thesis, we explore computational methods to parameterize the clothing pieces relative to a pattern’s coordinate system to achieve pattern continuity over garments. We review previous work related to pattern alignment on clothing. We also review surface quadrangulation methods. With a suitable quadrangulation, we can map any planar pattern with fourfold rotations into each quad, and achieve a seamless design. With an understanding of previous work, we approached the problems from three angles. First, we mapped patterns with sixfold rotations onto clothing by triangulating the clothing pieces and ensuring consistency of triangle vertices on both sides of a seam. We also mapped patterns with fourfold rotations onto clothing by optimizing the shape of each clothing piece in the texture domain. Lastly, we performed quadrangulation guided by cross fields, and mapped fourfold pattern units into each quad. We assembled and simulated the texture mapped clothing in Blender to visualize the results.